The Panel Type AMC Filter is a high-cleanliness solution designed specifically to eliminate molecular contaminants in critical "point-of-use" applications. Whether installed upstream of HEPA/ULPA filters in Fan Filter Units (FFUs), cleanroom ceilings, or integrated into reticle and wafer stockers, this filter provides a robust barrier against gaseous pollutants. It utilizes proprietary chemical filtration media to target specific AMC or multiple contaminants simultaneously, ensuring the highest air purity for semiconductor and microelectronic manufacturing.

Our panel filters feature a advanced pleated structure with adsorbents embedded within synthetic fibers, assembled in a lightweight yet durable Aluminum (AL) frame. This design maximizes the chemical adsorption surface area while maintaining an exceptionally low resistance to airflow. Every unit is strictly tested for outgassing and particle shedding to fulfill the rigorous cleanliness requirements of modern Fabs. By removing acids, bases, and VOCs at the source, our panels prevent wafer defects and avoid impairing the performance of high-efficiency particulate filters on the outlet side.

Features

• High Adsorption Capacity: Features a dual-action MA+MB-1000gsm carbon density for superior chemical loading.
• Ultra-Low Pressure Drop: Designed for energy efficiency, maintaining < 55 Pa at a face velocity of 0.45 m/s.
• Multi-Sorbent Technology: Combines ion exchange resins and impregnated carbon to target Acids, Bases, and VOCs in a single panel.
• Non-Outgassing & Non-Dusting: Constructed with cleanroom-compatible materials to ensure no secondary contamination of dopants or organics.
• Slim & Compact Design: Low-profile depth allows for easy installation in space-constrained FFUs and process equipment.
• Aluminum Frame Construction: Lightweight, corrosion-resistant, and fitted with white galvanized painted mesh for structural integrity.
• Proven Efficiency: Capable of reducing 10ppb concentrations of SO2, NH3, and O3 to < 2ppb (adsorption > 90%).

Applications

• FFU (Fan Filter Units): Primary chemical filtration layer in cleanroom ceiling grids.
• Wafer & Reticle Stockers: Protection of sensitive materials during storage.
• Minienvironments: Localized AMC control for lithography, etching, and metrology tools.
• Process Equipment: Integration into OEM tools for targeted gas removal.
• Pharmaceutical Sterile Suites: Controlling chemical odors and airborne cross-contamination.

Applications

Designed for versatility, the Panel Type AMC Filter is the ideal choice for high-tech facilities ranging from wafer manufacturing and HDD production to flat panel display facilities. Its flat-panel design is specifically optimized for seamless integration into FFUs and localized minienvironments, providing a flexible and scalable solution for managing chemical air quality in the most sensitive production zones.

Specifications

• Filter Type: Panel (PNL).Frame Material: Aluminum (AL).
• Target Gases: Acids (MA), Bases (MB), VOCs.
• Carbon Content: MA+MB-1000 gsm.
• Filtration Area: 2.9 m2 (Acid removal) + 2.9 m2 (Base removal).
• Airflow Capacity: 880 CMH.
• Pressure Drop: < 55 Pa @ 0.45 m/s.
• Mesh: White galvanized painted mesh (Inlet/Outlet).
• Gasket: 3mm EPDM on the outlet side.
• Pleat Count: 63 pleats (PPI: 1.8).

Specifications

The standard Panel Type AMC Filter comes in dimensions of 900x600x96mm, with customizable sizes available to fit any specific equipment housing. It features a high-density pleated media with a 40mm pleat height, providing a combined filtration area of nearly 6 m2 in a compact footprint. Engineered for long-term stability, it maintains high adsorption efficiency (> 90%) even when challenged with 10ppb levels of ammonia or sulfur dioxide, ensuring your cleanroom environment remains well within molecular safety limits.

Gallery

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  Engineered for high-precision removal of AMC