Our Box Type Pleated Filter is a premium solution specifically engineered to eliminate molecular contaminants at low concentration levels in critical manufacturing environments. By leveraging proven Dry Processed Carbon Composite Media (DPCC) technology, this filter offers high-capacity adsorption and exceptional chemical removal efficiency. We provide five specialized impregnated carbon blends to target specific contaminants, ensuring your cleanroom environment meets the strictest ISO standards for molecular purity.

Designed for high-performance air handling, the pleated box configuration maximizes the chemical media surface area while maintaining a consistent distribution of carbon granules. This structural design ensures that the filter achieves a high removal rate (>90%) even under high face velocity (2.5 m/s). Its non-dusting construction prevents secondary contamination, making it a reliable component for sensitive semiconductor fabrication lines and pharmaceutical sterile suites.

Features

• Low Initial Static Pressure: Optimized pleat design ensures high airflow (up to 3400 CMH) with low resistance, significantly reducing energy consumption.
• Advanced DPCC Technology: Utilizing Dry Processed Carbon Composite media for maximized chemical adsorption surface area.
• Multi-Gas Control: Customizable media blends available for targeted removal of Acids, Bases (Alkalines), and Organic compounds (VOCs).
• Non-Dusting & Low Outgassing: Carbon granules are securely bonded to synthetic fibers, ensuring no particle shedding or chemical outgassing.
• High Removal Efficiency: Achieves an initial removal efficiency of over 90% for targeted molecular contaminants.
• Robust Construction: Features a galvanized steel or stainless steel frame with double-sided diamond mesh for structural integrity.
• MERV 8 Particulate Efficiency: Provides dual-action filtration by handling both particulate and molecular contaminants.

Applications

• MAU (Make-up Air Units): Fresh air intake treatment for semiconductor cleanrooms.
• RCU (Recirculation Air Units): Maintaining air purity in circulating systems.
• Dry Coils: Protection against chemical corrosion and deposition.
• Semiconductor Fabrication: Prevention of AMC-related wafer defects.
• Pharmaceutical & Biotech: Controlling airborne chemical cross-contamination in labs and production areas.

Applications

This filter is specifically designed for high-airflow environments such as Semiconductor Fabs, TFT-LCD manufacturing, and pharmaceutical cleanrooms. It is ideally installed in MAU, RCU, and Dry Coil systems where "Low Pressure Drop" and "No Outgassing" are critical to maintaining production yield and energy efficiency.

Specifications

• Media Type: Activated Carbon / Impregnated Carbon / Ion Exchange Resin.
• Target Gases: Acids (SOx, NOx, HCl), Bases (NH3, Amines), Organics (VOCs).
• Initial Removal Efficiency: > 90%.
• Pressure Drop: < 120 Pa @ 3400 CMH (Model: W592H592D292mm).
• Carbon Content: 800 gsm.
• Frame Material: Galvanized Iron (GI) or Stainless Steel (SUS).
• Gasket: 6mm EPDM on the outlet side.
• Max Dimensions: 1200 × 1000 × 100 mm (Customizable sizes available).

Specifications

The Box Type Pleated Filter is available in standard dimensions including 592x592x292mm (Airflow: 3400 CMH) and 287x592x292mm (Airflow: 1700 CMH). Each unit is built with a high-pleat count (up to 32 pleats) and a pleat height of 260mm to maximize the filtration area (up to 9.7 m²). The product weighs less than 16kg, making it easy to install in standard filter banks. Custom frames and media configurations are available to meet specific AMC mitigation requirements.

Gallery

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  Designed for high-airflow environments

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  Fresh air intake treatment for semiconductor cleanrooms

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  Designed for advanced AMC control

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  Engineered to eliminate molecular contaminants

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  Designed for high-performance air handling